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A pattern is generated by creating a pattern object and applying the pattern object to an entity or feature. An entity to which a pattern is applied is called a
seed entity. If a pattern is applied to a feature, an entity that will identify the feature (e.g., one face of a bump that is to be patterned) must be specified. The entities generated by the application of the pattern are "true"
ACIS entities (ENTITY classes). Entities of type
BODY,
LUMP,
SHELL,
FACE, and
LOOP support patterns.
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